Latest News

Photochemistry on surfaces

Collision induced migration

Patterning and lithography

Surface diffusion

Kinetics of surface reactions

Coverage grating formation by LITD
Potassium on Ru

Xenon on Ru

Buffer Layer Assisted Laser Patterning of metals on surfaces

Gabriel Kerner and Micha Asscher*
Dept. of Physical Chemistry, The
Farkas Center for Light induced processes,
The Hebrew
University of Jerusalem, Israel.

An innovative method is presented for a single pulse, macroscopic scale laser patterning of metallic thin film to form nanometer range variable width conducting wires. Metallic gold is patterned employing laser induced thermal desorption (LITD) of a physisorbed buffer gas multilayer.  The method is demonstrated for xenon and CO2 buffer layer over Ru substrate. Upon annealing, the physisorbed layer desorbs and the metallic pattern softly lands and strongly attaches to the substrate. This is a highly versatile patterning technique that can be employed with practically any element and chemical species. The metallic structures are composed of nanometer size clusters, their size and distribution depend on the buffer layer thickness. The structure and thermal stability of the metallic pattern has been studied by means of AFM and linear diffraction.



Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: An alternative approach for photo-lithography

Gabriel Kerner, Ori Stein and Micha Asscher*

Department of Physical Chemistry and The Farkas Center for Light induced processes, The Hebrew University of Jerusalem, Israel

  Buffer Layer Assisted Laser Patterning (BLALP) method is presented, for patterning metallic layers on surfaces, using laser desorption of a physisorbed buffer layer, e.g. Xe, CO2 or H2O. This technique is based on the utilization of a low power laser pulse used as the photolithographic printer of a metallic thin film. Using a weakly bound buffer material as the template for laser patterning, led to the development of two complementary procedures, ‘positive’ and ‘negative’ BLALP. It is discussed as a potential alternative for standard photo-lithography, promising a cleaner, more cost effective, better resolution and more environmentally friendly procedure.